Ion-exchange Agarose Resin
Based on agarose microspheres, GLKgel IEX resin provide SP, Q, ANX, DEDA, MMC, MMA series of ion-exchange chromatography media to need different purification processes.
GLKgel Strong Cation IEX SP Resin
SP 6BB | SP 6FF | SP 6HF | SP 6HP | SP 6XL | SP HPR | |
Substrate | 6% cross-linked Agarose | High-rigid Agarose | 6% cross-linked Agarose | 6% cross-linked Agarose with glucan | High-rigid Agarose | |
Particle Size | 200μm (165-300μm) | 90μm (45-165μm) | 90μm (45-165μm) | 37μm (25-45μm) | 90μm (45-165μm) | 37μm (25-45μm) |
Ligand | -CH2CH2CH2SO3- | |||||
Loading Capacity | 180-250μmol H+/ml resin | 140-200μmol H+/ml resin | 150-200μmol H+/ml resin | 180-250μmol H+/ml resin | 130-160μmol H+/ml resin | |
pH Stability | 4-13 (Long) 3-14 (Short) | 4-12 (Long) 3-14 (Short) | 4-13 (Long) 3-14 (Short) | 4-12 (Long) 3-14 (Short) | ||
Pressure | ≤0.3MPa | ≤0.5MPa | ||||
Flow Rate | 1800cm/h | 700 cm/h | 100 cm/h | 150 cm/h | 700 cm/h | 400 cm/h |
Chemical Stability | All common buffer, 1.0m sodium hydroxide, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol Avoid using oxidant, cationic detergent, cationic buffer | |||||
Storage | 0.2M NaAc, 20% EtOH, 4-30℃ |
GLKgel Strong Anion IEX Q Resin
Q 6BB | Q 6FF | Q 6HF | Q 6HP | Q 6XL | Q HPR | |
Substrate | 6% cross-linked Agarose | High-rigid Agarose | 6% cross-linked Agarose | 6% cross-linked Agarose with glucan | High-rigid Agarose | |
Particle Size | 200μm (165-300μm) | 90μm (45-165μm) | 90μm (45-165μm) | 37μm (25-45μm) | 90μm (45-165μm) | 37μm (25-45μm) |
Ligand | -N+(CH3)3 | |||||
Loading Capacity | 180-250μmol Cl-/ml resin | 160-200μmol Cl-/ml resin | 140-200μmol Cl-/ml resin | 180-250μmol Cl-/ml resin | 150-180μmol Cl-/ml resin | |
pH Stability | 2-12 (Long Period) 2-14 (Short Period) | 2-12 (Long) 2-14 (Short ) | 2-12 (Long) 2-14 (Short) | 2-12 (Long ) 2-14 (Short) | ||
Pressure | ≤0.3MPa | ≤0.5MPa | ||||
Flow Rate | 1800cm/h | 700 cm/h | 1000 cm/h | 150 cm/h | 700 cm/h | 400 cm/h |
Chemical Stability | All common buffer, 1.0m sodium hydroxide, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol Avoid using oxidant, cationic detergent, cationic buffer | |||||
Storage | 20% EtOH, 4-30℃ |
GLKgel Strong Anion IEX MMA Resin
Substrate | Particle Size | Capacity | pH Stability | Pressure | Flow Rate | |
MMA 6HF | High Rigid Agarose | 90μm (45-165μm) | 90-120μmol Cl-/ml resin | 2-14 (Long) 4-12 (Short) | ≤0.5 MPa | 1000 cm/h |
MMA HPR | High Rigid Agarose | 37μm (25-45μm) | 80-110μmol Cl-/ml resin | 2-14 (Long) 4-12 (Short) | ≤0.5 MPa | 400 cm/h |
Chemical Stability | All common buffer, 1.0m NaOH, 8.0m urea, 6.0m GuHCl, 70% ethanol Avoid using oxidant, cationic detergent, cationic buffer | |||||
Storage | 20% EtOH, 4-30℃ |
GLKgel Weak Cation IEX CM Resin
CM 6FF | CM 6HF | CM 6HP | CM 6XL | |
Substrate | 6% cross-linked Agarose | High-rigid Agarose | 6% cross-linked Agarose | 6% cross-linked Agarose with glucan |
Particle Size | 90μm (45-165μm) | 90μm (45-165μm) | 37μm (25-45μm) | 90μm (45-165μm) |
Ligand | -O-CH2COO- | |||
Capacity | 90-130μmol H+/ml resin | 90-120μmol H+/ml resin | 80-110μmol H+/ml resin | 180-250μmol H+/ml resin |
pH Stability | 4-13 (Long) 2-14 (Short) | 4-12 (Long) 3-14 (Short) | 4-13 (Long) 2-14 (Short) | |
Pressure | ≤0.3 MPa | ≤0.5MPa | ≤0.3 MPa | |
Flow Rate | 700 cm/h | 1000 cm/h | 150 cm/h | 700 cm/h |
Chemical Stability | All common buffer, 1.0m NaOH, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol Avoid using oxidant, cationic detergent, cationic buffer | |||
Storage | 20% EtOH, 4-30℃ |
GLKgel Weak Cation IEX MMC Resin
| Substrate | Particle Size | Capacity | pH Stability | pH Stability | Flow Rate |
MMC 6HF | High Rigid Agarose | 90μm (45-165μm) | 70-90μmol H+/ml resin | 2-14 (Long) 3-12 (Short) | ≤0.5 MPa | 1000 cm/h |
MMC HPR | High Rigid Agarose | 37μm (25-45μm) | 60-80μmol H+/ml resin | 2-14 (Long) 3-12 (Short) | ≤0.5 MPa | 400 cm/h |
Chemical Stability | All common buffer, 1.0m NaOH, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol Avoid using oxidant, cationic detergent, cationic buffer | |||||
Storage | 20% EtOH, 4-30d |
GLKgel Weak Anion IEX DEAE Resin
DEAE 6FF | DEAE 6HF | DEAE 6HP | DEAE 6XL | |
Substrate | 6% cross-linked Agarose | High-rigid Agarose | 6% cross-linked Agarose | 6% cross-linked Agarose |
Particle Size | 90μm (45-165μm) | 90μm (45-165μm) | 37μm (25-45μm) | 90μm (45-165μm) |
Ligand | -N+(CH3)3 | |||
Capacity | 110-160μmol Cl-/ml resin | 290-350μmol Cl-/ml resin | 90-130μmol Cl-/ml resin | 110-160μmol Cl-/ml resin |
pH Stability | 2-13 (Long) 1-14 (Short) | 2-12 (Long) 2-14 (Short) | 2-13 (Long) 1-14 (Short) | |
Pressure | ≤0.3 MPa | ≤0.5MPa | ≤0.3 MPa | |
Flow Rate | 700 cm/h | 1000 cm/h | 150 cm/h | 700 cm/h |
Chemical Stability | All common buffer, 1.0m NaOH, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol Avoid using oxidant, cationic detergent, cationic buffer | |||
Storage | 20% EtOH, 4-30℃ |
GLKgel Weak Anion IEX ANX Resin
Substrate | Particle Size | Ligand | Capacity | pH Stability | pH Stability | Flow Rate | |
ANX 4FF | 4% cross-linked Agarose | 90μm (45-165μm) | -N+(C2H5)2H | 130-170μmol Cl-/ml resin | 3-10 (Long) 2-14 (Short) | ≤0.3 MPa | 250 cm/h |
Chemical Stability | All common buffer, 1.0m NaOH, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol Avoid using oxidant, cationic detergent, cationic buffer | ||||||
Storage | 20% EtOH, 4-30℃ |
Related Products
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