VirCap® Oligo dT(25) Affinity Resin
For mRNA Purification
VirCap® Oligo dT(25) Affinity Resin is based on rigid, 50μm polymeric resin designed to isolate messenger RNA (mRNA). The resin backbone consists of crosslinked poly(styrene-divinylbenzene).
The polyhydroxy surface coating provides low non-specific binding. The surface is functionalized with poly(dT) and allows capture of mRNA through base pairing with the mRNA polyA tail.
VirCap® Oligo dT(25) Affinity Resin provides efficient capture and release under standard mRNA purification conditions. It thereby decreases process development time and enhances productivity. In addition, the selective nature of this resin allows a reduction in plasmid DNA and other transcription mix components. The resin is also stable at elevated temperatures for the breakdown of undesired higher-order structures if required.
Features
- Easy mRNA purification from crude transcription mix to effectively remove plasmid DNA and other IVT components
- Simplified workflow helps to maximize efficiency, thereby reducing the complexity of subsequent polish steps
- Excellent scalability
- Non-animal derived
VirCap® Oligo ligands are manufactured using a synthetic manufacturing process that is free of animal components.
Specification
| Support matrix | Cross-linked poly (styrene-divinylbenzene) |
| Surface functionality | dT-25mer |
| Ligand density | 0.2 umol dT/mL resin |
| Shipping solvent | 20% ethanol |
| Average particle size | 50 µm |
| Average pore diameter | 200 nm |
| Mechanical resistance | 1000 psi (6.9 MPa) |
| Suggested compression factor | 1.06 |
| Operating temperature | 2 to 65˚C Do not freeze |
Chemical & Thermal Resistance
| pH Range | 2–13 |
| Ionic strength range | 0 to 5 M, all common salts |
| Buffer additives | Common agents for mRNA purification, including 0.5 M NaOH, 2 MMgCl2, 20 mM EDTA. Do not expose to strong oxidizers (such as hypochlorite), oxidizing acids (such as nitric), strong reducing agents (such as sulfite), acetone, THF, or benzyl alcohol. |
| Solvents | Water, 0 to 100% alcohol, acetonitrile, 2 M acetic acid, 1 M HCl, other common organic solvents. Do not expose to strong oxidizers (such as hypochlorite), oxidizing acids (such as nitric), strong reducing agents (such as sulfite), acetone, benzyl alcohol, or THF. |
| Flow rate | Adjust flow rate depending on performance. Do not exceed upper-pressure limitations. |
