Ion-exchange Agarose Resin
Based on agarose microspheres, GLKgel IEX resin provide SP, Q, ANX, DEDA, MMC, MMA series of ion-exchange chromatography media to need different purification processes.
GLKgel Strong Cation IEX SP Resin
| SP 6BB | SP 6FF | SP 6HF | SP 6HP | SP 6XL | SP HPR | |
| Substrate | 6% cross-linked Agarose | High-rigid Agarose | 6% cross-linked Agarose | 6% cross-linked Agarose with glucan | High-rigid Agarose | |
| Particle Size | 200μm
(165-300μm) |
90μm
(45-165μm) |
90μm
(45-165μm) |
37μm
(25-45μm) |
90μm
(45-165μm) |
37μm
(25-45μm) |
| Ligand | -CH2CH2CH2SO3- | |||||
| Loading
Capacity |
180-250μmol
H+/ml resin |
140-200μmol H+/ml resin | 150-200μmol H+/ml resin | 180-250μmol H+/ml resin | 130-160μmol H+/ml resin | |
| pH Stability | 4-13 (Long)
3-14 (Short) |
4-12 (Long)
3-14 (Short) |
4-13 (Long)
3-14 (Short) |
4-12 (Long) 3-14 (Short) |
||
| Pressure | ≤0.3MPa | ≤0.5MPa | ||||
| Flow Rate | 1800cm/h | 700 cm/h | 100 cm/h | 150 cm/h | 700 cm/h | 400 cm/h |
| Chemical Stability | All common buffer, 1.0m sodium hydroxide, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol
Avoid using oxidant, cationic detergent, cationic buffer |
|||||
| Storage | 0.2M NaAc, 20% EtOH, 4-30℃ | |||||
GLKgel Strong Anion IEX Q Resin
| Q 6BB | Q 6FF | Q 6HF | Q 6HP | Q 6XL | Q HPR | |
| Substrate | 6% cross-linked Agarose | High-rigid Agarose | 6% cross-linked Agarose | 6% cross-linked Agarose with glucan | High-rigid Agarose | |
| Particle Size | 200μm
(165-300μm) |
90μm
(45-165μm) |
90μm
(45-165μm) |
37μm
(25-45μm) |
90μm
(45-165μm) |
37μm (25-45μm) |
| Ligand | -N+(CH3)3 | |||||
| Loading Capacity | 180-250μmol
Cl-/ml resin |
160-200μmol
Cl-/ml resin |
140-200μmol
Cl-/ml resin |
180-250μmol Cl-/ml resin | 150-180μmol Cl-/ml resin | |
| pH Stability | 2-12 (Long Period)
2-14 (Short Period) |
2-12 (Long)
2-14 (Short ) |
2-12 (Long)
2-14 (Short) |
2-12 (Long )
2-14 (Short) |
||
| Pressure | ≤0.3MPa | ≤0.5MPa | ||||
| Flow Rate | 1800cm/h | 700 cm/h | 1000 cm/h | 150 cm/h | 700 cm/h | 400 cm/h |
| Chemical Stability |
All common buffer, 1.0m sodium hydroxide, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol Avoid using oxidant, cationic detergent, cationic buffer |
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| Storage | 20% EtOH, 4-30℃ | |||||
GLKgel Strong Anion IEX MMA Resin
| Substrate | Particle Size | Capacity | pH Stability | Pressure |
Flow Rate |
|
|
MMA 6HF |
High Rigid
Agarose |
90μm
(45-165μm) |
90-120μmol
Cl-/ml resin |
2-14 (Long)
4-12 (Short) |
≤0.5 MPa | 1000 cm/h |
| MMA HPR | High Rigid
Agarose |
37μm
(25-45μm) |
80-110μmol
Cl-/ml resin |
2-14 (Long)
4-12 (Short) |
≤0.5 MPa |
400 cm/h |
|
Chemical Stability |
All common buffer, 1.0m NaOH, 8.0m urea, 6.0m GuHCl, 70% ethanol
Avoid using oxidant, cationic detergent, cationic buffer |
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| Storage |
20% EtOH, 4-30℃ |
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GLKgel Weak Cation IEX CM Resin
| CM 6FF | CM 6HF | CM 6HP | CM 6XL | |
| Substrate | 6% cross-linked
Agarose |
High-rigid
Agarose |
6% cross-linked
Agarose |
6% cross-linked Agarose with glucan |
| Particle Size | 90μm (45-165μm) | 90μm (45-165μm) | 37μm (25-45μm) | 90μm (45-165μm) |
| Ligand | -O-CH2COO- | |||
| Capacity | 90-130μmol
H+/ml resin |
90-120μmol
H+/ml resin |
80-110μmol
H+/ml resin |
180-250μmol
H+/ml resin |
| pH Stability | 4-13 (Long)
2-14 (Short) |
4-12 (Long)
3-14 (Short) |
4-13 (Long) 2-14 (Short) |
|
| Pressure | ≤0.3 MPa | ≤0.5MPa | ≤0.3 MPa | |
| Flow Rate | 700 cm/h | 1000 cm/h | 150 cm/h | 700 cm/h |
|
Chemical Stability |
All common buffer, 1.0m NaOH, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol
Avoid using oxidant, cationic detergent, cationic buffer |
|||
| Storage | 20% EtOH, 4-30℃ | |||
GLKgel Weak Cation IEX MMC Resin
|
|
Substrate | Particle Size | Capacity | pH Stability | pH Stability | Flow Rate |
| MMC 6HF | High Rigid
Agarose |
90μm
(45-165μm) |
70-90μmol
H+/ml resin |
2-14 (Long)
3-12 (Short) |
≤0.5 MPa |
1000 cm/h |
|
MMC HPR |
High Rigid
Agarose |
37μm
(25-45μm) |
60-80μmol
H+/ml resin |
2-14 (Long)
3-12 (Short) |
≤0.5 MPa | 400 cm/h |
|
Chemical Stability |
All common buffer, 1.0m NaOH, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol Avoid using oxidant, cationic detergent, cationic buffer |
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| Storage |
20% EtOH, 4-30d |
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GLKgel Weak Anion IEX DEAE Resin
| DEAE 6FF | DEAE 6HF | DEAE 6HP | DEAE 6XL | |
| Substrate | 6% cross-linked Agarose | High-rigid Agarose | 6% cross-linked Agarose | 6% cross-linked Agarose |
| Particle Size | 90μm (45-165μm) | 90μm (45-165μm) | 37μm (25-45μm) | 90μm (45-165μm) |
| Ligand | -N+(CH3)3 | |||
| Capacity | 110-160μmol
Cl-/ml resin |
290-350μmol
Cl-/ml resin |
90-130μmol
Cl-/ml resin |
110-160μmol Cl-/ml resin |
| pH Stability | 2-13 (Long)
1-14 (Short) |
2-12 (Long)
2-14 (Short) |
2-13 (Long) 1-14 (Short) |
|
| Pressure | ≤0.3 MPa | ≤0.5MPa | ≤0.3 MPa | |
| Flow Rate | 700 cm/h | 1000 cm/h | 150 cm/h | 700 cm/h |
| Chemical Stability | All common buffer, 1.0m NaOH, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol
Avoid using oxidant, cationic detergent, cationic buffer |
|||
| Storage | 20% EtOH, 4-30℃ | |||
GLKgel Weak Anion IEX ANX Resin
| Substrate | Particle Size | Ligand | Capacity | pH Stability | pH Stability | Flow Rate | |
| ANX 4FF | 4% cross-linked Agarose | 90μm (45-165μm) | -N+(C2H5)2H | 130-170μmol
Cl-/ml resin |
3-10 (Long)
2-14 (Short) |
≤0.3 MPa | 250 cm/h |
| Chemical Stability |
All common buffer, 1.0m NaOH, 8.0m urea, 6.0m guanidine hydrochloride, 70% ethanol Avoid using oxidant, cationic detergent, cationic buffer |
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| Storage | 20% EtOH, 4-30℃ | ||||||
Related Products
- S40 Strong Cation Exchange Media
- CM40 Weak Cation Exchange Media
- Q40 Strong Anion Exchange Media
- D40 Weak Anion Exchange Media
Glass Column
- Fixed-bed glass column
- Single-layer glass column
- Double-layer glass column